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Figure 3 | Journal of Nanobiotechnology

Figure 3

From: Electron beam fabrication of a microfluidic device for studying submicron-scale bacteria

Figure 3

Schematic of the fabrication of multiple structures in Si with sub-micron size growth channels using EBL and dry etching. The growth channels are etched first, followed by the main trench. The steps to conduct this are as follows. (Steps 1–3) A 4 silicon wafer is cleaned and prepared for electron beam patterning. (Steps 4–5) Specific regions of the PMMA is exposed to the electron beam and developed. (Step 6) Dry etching of the structures into the wafer is performed. This whole process is then repeated to etch the main trench into the silicon wafer.

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