Fig. 1

Preparation and characterization of designed mask and obtained micropatterns. a Schematic illustration of micropattern preparation through positive photoresist PVA on TCPS plates. b Representative images of designed mask with various microcircles. The diameters were designed as 30, 40, 60 and 80 μm and the corresponding spreading areas were 706, 1256, 2826 and 5024 μm². Scale bar: 100 μm. c Representative images of prepared micropatterns captured by a fluorescence microscope for upper row. Scale bar: 100 μm. The bottom was the gray value of micropatterns calculated from the fluorescent images