Fig. 7From: Fabrication of device with poly(N-isopropylacrylamide)-b-ssDNA copolymer brush for resistivity studyResistivities of PNIPAAm-b-ssDNA copolymer brushes (logarithmic scale) plotted with respect to the hybridization concentration of the target, CS75, CS50, CS25 and CS0 sequences (0.5–16 ng/µL) at a 25 °C and b 45 °CBack to article page