Fig. 2

Adherent and Flow photoporation: experimental set-up and protocol. a Scheme for in-chip flow photoporation. Irradiation of a mix of suspended HeLa cells and AuNPs by the elliptical nanosecond laser pulse within a microfluidic chip with \({100}~{\upmu \hbox {m}}\) deep channels. The chip is an assembly of glass-silicon-glass obtained by anodic-bonding and dry-etching of the Si wafer. The two-stage flow focusing arranges the flow with respect to the elliptical laser beam. The suspension is injected at fixed flowrates with respect to the laser repetition rate along with FITC-Dextran solution at fixed concentration. Irradiated samples are retrieved at the outlet before washing and fluorescence microscopy. b Optical set-up to shape the nanosecond laser beam with respect to the microfluidic geometry. The same apparatus is used for both adherent and flow photoporation and produces a laser beam \(\simeq {120}\upmu {\hbox {m}}\) wide in the x direction. c Elliptical laser beam at the sample. The fluence profile of the beam is measured by Rhodamine B fluorescence on the camera to obtain the local laser profile intensity value with respect to the position during the photoporation