From: Roles of MXenes in biomedical applications: recent developments and prospects
Synthesis method | MAX-phase | MXene | Etchant | Temperature | Delamination | Features | Refs. | ||
---|---|---|---|---|---|---|---|---|---|
Type of precursors | MAX-phase | Metal | Ti3AlC2 | Ti3C2 | HF | RT | Without delamination | Traditional synthesis, which has been extensively studied | [14] |
No-MAX-phase | YAl3C3 | YCx | HCL/LiF HF | DMSO | Emerging synthetic methods for specific metal elements such as the transition metals Zr and Hf | [26] | |||
Hf3[Al(Si)]4C6 | Hf3C2 | HF | Without delamination | [66] | |||||
Mo2Ga2C | Mo2C | HF | 50 °C | Without delamination | [25] | ||||
Based on etchants | HF-etching | HF | Ti3AlC2 Nb2AlC | Ti3C2 Nb2C | HF HF | RT RT | Without delamination TPAOH | Disadvantages: It is highly corrosive and harmful to humans and the environment. Remaining HF could induce cell death, thereby harming the health of biological organisms | [67] [18] |
HF/Oxidizing agent | Ti3SiC2 | Ti3C2 | HF/H2O2 | 40 °C | [44] | ||||
Non-HF-etching | Situ HF etching | Ti3AlC2 | Ti3C2 | HCl/LiF | 40 °C | in distilled water via ultrasonication | Advantages: This method avoids the toxicity of MXenes during the synthesis process and is less hazardous | [45] | |
Bifluoride solutions | Ti3AlC2 | Ti3C2 | KHF2 or NaHF2 | 60 °C | Without delamination | Advantages: During the etching process, NH4+ Na+, or K+ ions could enter the interlayer space of MXenes, further enlarging the interplanar spcccscacing and promoting the delamination efficiency | [46] | ||
Ti3AlC2 | Ti3C2 | NH4HF2 | 60 °C | dimethyl sulfoxide via ultrasonication under argon | [68] | ||||
Molten fluorides | Ti4AlN3 | Ti4N3 | LiF, NaF, KF | 550 °C | TBOAH and Sonication | Advantages: Compared to Mn+1AlCn, Al atoms are more strongly bonded in Mn+1AlNn, so it is difficult to eliminate the A-layer from nitride-based MAX phases. This approach using molten fluorides with the assistance of high-temperature heating can provide higher energy to etch the A-layer from the MAX phase | [49] | ||
Ti3AlC2 | Ti3C2 | CdBr2 | N-methyl formamide | [8] | |||||
Fluorine-free | Ti3AlC2 | Ti3C2 | NH4OH | RT | Without delamination | Advantages: Etching with fluorine-free etchants can be performed to produce controllable functional surface termination of MXenes | [67] | ||
Ti2AlC | Ti2CTx | electrochemical etching | [51] | ||||||
V2C Mo2C | V2N Mo2N | ammonification | 600 °C | [50] | |||||
Ti3AlC2 | Ti3C2Tx | NaOH, | 270 °C | DMSO | [69] | ||||
Bottom-up approach | CVD | Mo2N | Advantages: Enabling precise manipulation of the size distribution, geometric morphology, surface termination of MXenes and simple implementation | [62] | |||||
Mo2C | [63] | ||||||||
PLD | Mo2C | [64] | |||||||
Salt template methods | W2N, V2N | [65] |